Defect density reduction on the VIISta 810 implanter

Proceedings of the International Conference on Ion Implantation Technology

Volumn 1, Issue , 1999, Pages 173-175

  Scheuer, J T ^a   Renau, A ^a   Smatlak, D L ^a   Olson, J C ^a   Cucchetti, A ^a  

^a VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL DEFECTS; GRAPHITE ELECTRODES; IMPURITIES; MAGNETS; RADIATION DAMAGE; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTOR DOPING; SILICON; SILICON WAFERS;

ION IMPLANTERS;

ION IMPLANTATION;

EID: 0033353855     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)