Er-doped ZnO films grown by pulsed e-beam deposition

Journal of Physics Condensed Matter

Volumn 19, Issue 26, 2007, Pages

  Pan, Z ^a   Morgan, S H ^a   Ueda, A ^a   Aga Jr , R ^a   Steigerwald, A ^a   Hmelo, A B ^b   Mu, R ^a  

^a FISK UNIVERSITY   (United States)

^b VANDERBILT UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; DOPING (ADDITIVES); ELECTRON BEAMS; ERBIUM; FILM GROWTH; FUSED SILICA; PHOTOLUMINESCENCE; RUTHERFORD BACKSCATTERING SPECTROSCOPY; ZINC OXIDE;

DEEP LEVEL EMISSION; PULSED ELECTRON BEAM DEPOSITION (PED);

THIN FILMS;

EID: 34250751346     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/19/26/266216     Document Type: Article

References (29)

1. Polman A and van Veggel F C J M 2004 J. Opt. Soc. Am. B 21 871
2. Wilson R G, Schwartz R N, Abernathy C R, Pearton S J, Newman N, Rubin M, Fu T and Zavada J M 1994 Appl. Phys. Lett. 65 992
3. Pan Z, Ueda A, Morgan S H and Mu R 2006 J. Rare Earths 24 699
4. Komuro S, Katsumata T, Morikawa T, Zhao X, Isshiki H and Aoyagi Y 2000 Appl. Phys. Lett. 76 3935
5. Ishii M, Komuro S, Morikawa T and Aoyagi Y 2001 J. Appl. Phys. 89 3679
6. Bubendorff J L, Ebothe J, El Hichou A, Dounia R and Addou M 2006 J. Appl. Phys. 100 014505
7. Park Y K, Han J I, Kwak M G, Yang H, Ju S H and Cho W S 1998 Appl. Phys. Lett. 72 668
8. Mais N, Reithmaier J P, Forchel A, Kohls M, Spanhel L and Müller G 1999 Appl. Phys. Lett. 75 2005
9. Wahl U, Rita E, Correia J G, Alves E and Arajo J P and The ISOLDE Collaboration 2003 Appl. Phys. Lett. 82 1173
10. Alves E, Rita E, Wahl U, Correia J G, Monteiro T, Soares J and Boemare C 2003 Nucl. Instrum. Methods B 206 1047
11. Zhang X T, Liu Y C, Ma J G, Lu Y M, Shen D Z, Xu W, Zhong G Z and Fan X W 2002 Thin Film 413 257
12. Komuro S, Katsumata T, Morikawa T, Zhao X, Isshiki H and Aoyagi Y 2000 J. Appl. Phys. 88 7129
13. Pérez-Casero R, Gutierréz-Llorente A, Pons-Y-Moll O, Seiler W, Defourneau R M, Defourneau D, Millon E, Perriére J, Goldner P and Viana B 2005 J. Appl. Phys. 97 054905
14. Bachir S, Azuma K, Kossanyi J, Valat P and Ronfard-Haret J C 1997 J. Lumin. 75 35
15. Jiang Q D, Matacotta F C, Konijnenberg M C, Mueller G and Schultheiss C 1994 Thin Solid Films 241 100
16. Aga R S, Cox C, Ueda A and Jackson E 2006 J. Vac. Sci. Technol. A 24 L11
17. Rita E, Alves E, Wahl U, Correia J G, Monteiro T, Soares M J, Neves A and Peres M 2006 Nucl. Instrum. Methods B 242 580
18. Bethke S, Pan H and Wessels B W 1988 Appl. Phys. Lett. 52 138
19. Garces N Y, Wang L, Bai L, Giles N C, Halliburton L E and Cantwell G 2002 Appl. Phys. Lett. 81 622
20. Ishii M, Ishikawa T, Ueki T, Komuro S, Morikawa T, Aoyagi Y and Oyanagi H 1999 J. Appl. Phys. 85 4024
21. Zhou Z, Komori T, Yoshino M, Morinaga M, Matsunami N, Koizumi A and Takeda Y 2005 Appl. Phys. Lett. 86 041107
22. Pan Z, Morgan S H, Loper A, King V, Long B H and Collins W E 1995 J. Appl. Phys. 77 4688
23. Pan Z, Morgan S H, Dyer K, Ueda A and Liu H 1996 J. Appl. Phys. 79 8906
24. Pan Z and Morgan S H 1997 J. Lumin. 75 301
25. Polman A 1997 J. Appl. Phys. 82 1
26. Pan Z, Ueda A, Hays M, Mu R and Morgan S H 2006 J. Non-Cryst. Solids 352 801
27. Pan Z, Ueda A, Mu R and Morgan S H 2007 J. Lumin. 126 251
28. Shinn M D, Sibley W A, Drexhage M G and Brown R N 1983 Phys. Rev. B 27 6635
29. Shinn M D, Windscheif J C, Sardar D K and Sibley W A 1982 Phys. Rev. B 26 2371