Influence of background gas pressure charging potential and target distance on the spot size ablated by single pulsed electron beam

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 6, 2006, Pages 11-14

  Aga Jr , Roberto S ^a   Cox, Chase ^a   Ueda, Akira ^a   Jackson, Enrique ^a   Collins, W E ^a   Mu, Richard ^a  

^a FISK UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; GASES; LASER ABLATION; LASER PULSES; PARAMETER ESTIMATION;

CHARGING POTENTIALS; MATERIAL FABRICATION; PULSED ELECTRON DEPOSITION (PED); TARGET DISTANCE;

PRESSURE EFFECTS;

EID: 33750949032     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2360970     Document Type: Article

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