Origin of colossal dielectric response of Ca Cu3 Ti4 O12 studied by using CaTi O3 Ca Cu3 Ti4 O12 CaTi O3 multilayer thin films

Applied Physics Letters

Volumn 90, Issue 24, 2007, Pages

  Mitsugi, Masakazu ^a   Asanuma, Shutaro ^a   Uesu, Yoshiaki ^a   Fukunaga, Mamoru ^b   Kobayashi, Wataru ^a   Terasaki, Ichiro ^a  

^a WASEDA UNIVERSITY   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CALCIUM ALLOYS; COLOSSAL MAGNETORESISTANCE; DIELECTRIC DEVICES; PERMITTIVITY; PULSED LASER DEPOSITION; THIN FILMS;

BARRIER LAYER CAPACITORS; COLOSSAL DIELECTRIC RESPONSE (CDR); MULTILAYER THIN FILMS;

MULTILAYER FILMS;

EID: 34250690500     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2748854     Document Type: Article

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