Electron field emission from boron doped microcrystalline diamond

Applied Surface Science

Volumn 253, Issue 18, 2007, Pages 7381-7386

  Roos, M ^a   Baranauskas, V ^a   Fontana, M ^a   Ceragioli, H J ^a   Peterlevitz, A C ^a   Mallik, K ^b   Degasperi, F T ^c  

^a Faculdade de Engenharia Elétrica e de Computação   (Brazil)

^b UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

^c FACULDADE DE TECNOLOGIA DE SÃO PAULO   (Brazil)

Author keywords

Boron doped diamond surface; Chemical vapor deposited diamond; Electron field emission; Emission properties of surface sites; Threshold field for electron emission

Indexed keywords

BORON; CONCENTRATION (PROCESS); CRYSTALLINE MATERIALS; DIAMONDS; DOPING (ADDITIVES); ELECTRONS;

BORON DOPED DIAMOND SURFACE; CHEMICAL VAPOR DEPOSITED DIAMOND; ELECTRON FIELD EMISSION; EMISSION PROPERTIES OF SURFACE SITES; THRESHOLD FIELD FOR ELECTRON EMISSION;

FIELD EMISSION;

EID: 34249997858     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.03.023     Document Type: Article

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