Metal-insulator transition in boron-ion implanted type IIa diamond

Diamond and Related Materials

Volumn 8, Issue 8-9, 1999, Pages 1508-1510

  Tshepe, T ^a   Prins, J F ^a   Hoch, M J R ^a  

^a UNIVERSITY OF THE WITWATERSRAND   (South Africa)

Author keywords

Annealing; Conductivity; Ion implantation; Metal insulator transition

Indexed keywords

BORON; ELECTRIC CONDUCTIVITY OF SOLIDS; HIGH TEMPERATURE OPERATIONS; ION IMPLANTATION; PHASE TRANSITIONS; RADIATION DAMAGE; RAPID THERMAL ANNEALING; SECONDARY ION MASS SPECTROMETRY;

COLD IMPLANTATION RAPID ANNEALING; METAL INSULATOR TRANSITION;

SEMICONDUCTING DIAMONDS;

EID: 0032594299     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(99)00066-7     Document Type: Article

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