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Volumn 9, Issue 3, 2007, Pages 345-360
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Structure-property relationships in the optimization of polysilicon thin films for electrical recording/stimulation of single neurons
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Author keywords
Brain interface; Microelectrodes; Microfabricated neural interfaces; Micromachined biological interfaces; Neural implants; Neural interface; Neural prostheses
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Indexed keywords
CMOS INTEGRATED CIRCUITS;
DIGITAL CIRCUITS;
MEMS;
MICROELECTRODES;
NEURONS;
POLYSILICON;
MICROFABRICATED NEURAL INTERFACES;
MICROMACHINED BIOLOGICAL INTERFACES;
NEURAL IMPLANTS;
NEURAL PROSTHESES;
POLYMER FILMS;
PHOSPHORUS;
PLATINUM;
SILICONE;
SODIUM CHLORIDE;
ARTICLE;
CELL ACTIVITY;
CONCENTRATION (PARAMETERS);
CONTROLLED STUDY;
ELECTRIC ACTIVITY;
ELECTRIC CAPACITANCE;
ELECTRIC POTENTIAL;
ELECTRICITY;
ELECTROCHEMICAL ANALYSIS;
HYDROLYSIS;
MICROELECTRODE;
MICROFILM;
NERVE CELL STIMULATION;
PARTICLE SIZE;
POTENTIOMETRY;
PRIORITY JOURNAL;
PROCESS OPTIMIZATION;
SIMULATION;
STRUCTURE ACTIVITY RELATION;
ACTION POTENTIALS;
COMPUTER-AIDED DESIGN;
ELECTRIC IMPEDANCE;
ELECTRIC STIMULATION;
EQUIPMENT DESIGN;
EQUIPMENT FAILURE ANALYSIS;
HARDNESS;
MATERIALS TESTING;
MEMBRANES, ARTIFICIAL;
MICROELECTRODES;
MONITORING, PHYSIOLOGIC;
NEURONS;
SILICON;
STRUCTURE-ACTIVITY RELATIONSHIP;
SURFACE PROPERTIES;
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EID: 34249981203
PISSN: 13872176
EISSN: None
Source Type: Journal
DOI: 10.1007/s10544-006-9039-x Document Type: Article |
Times cited : (8)
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References (38)
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