Focused ion beam tomography of a microelectronic device with sub- 2-nm resolution

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 3, 2007, Pages 922-925

  Yeoh, T S ^a   Ives, N A ^a   Presser, N ^a   Stupian, G W ^a   Leung, M S ^a   McCollum, J L ^b   Hawley, F W ^b  

^a AEROSPACE CORPORATION   (United States)

^b Actel Corp   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIFUSE STRUCTURES; NANOSCALE COMPONENTS; TWO DIMENSIONAL IMAGES; VOXEL DATASETS;

FIELD PROGRAMMABLE GATE ARRAYS (FPGA); MICROELECTRONICS; TOMOGRAPHY; TWO DIMENSIONAL;

FOCUSED ION BEAMS;

EID: 34249877143     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2740288     Document Type: Article

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