Concave microlens array mold fabrication in photoresist using UV proximity printing

Microsystem Technologies

Volumn 13, Issue 11-12, 2007, Pages 1537-1543

  Lin, Tsung Hung ^a   Yang, Hsiharng ^b   Chao, Ching Kong ^a  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

^b NATIONAL CHUNG HSING UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE DIFFRACTION; LITHOGRAPHY; PHOTORESISTS; POLYDIMETHYLSILOXANE; PRINTED CIRCUITS; ULTRAVIOLET RADIATION;

CONCAVE MICROLENS ARRAY; PRINTING GAP; UV PROXIMITY PRINTING;

MICROLENSES;

EID: 34249813435     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-006-0264-2     Document Type: Conference Paper

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