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Volumn 28, Issue 6, 2007, Pages 470-472

35-nm InP HEMT SMMIC amplifier with 4.4-dB gain at 308 GHz

Author keywords

High frequency; High electron mobility transistor (HEMT); Indium phosphide (InP); Submillimeter wave monolithic microwave integrated circuit (SMMIC) amplifier

Indexed keywords

HIGH ELECTRON MOBILITY TRANSISTORS; HIGH FREQUENCY AMPLIFIERS; MONOLITHIC MICROWAVE INTEGRATED CIRCUITS; SEMICONDUCTING INDIUM PHOSPHIDE; SUBMILLIMETER WAVES;

EID: 34249812665     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2007.896897     Document Type: Article
Times cited : (40)

References (8)
  • 2
    • 27844447021 scopus 로고    scopus 로고
    • 220-GHz metamorphic HEMT amplifier MMICs for high-resolution imaging applications
    • Oct
    • A. Tessmann, "220-GHz metamorphic HEMT amplifier MMICs for high-resolution imaging applications," IEEE J. Solid-State Circuits vol. 40, no. 10, pp. 2070-2076, Oct. 2005.
    • (2005) IEEE J. Solid-State Circuits , vol.40 , Issue.10 , pp. 2070-2076
    • Tessmann, A.1
  • 3
    • 27744593795 scopus 로고    scopus 로고
    • 50-nm T-gate metamorphic GaAs HEMTs with fT of 440 GHz and noise figure of 0.7 dB at 26 GHz
    • Nov
    • K. Elgaid, H. McLelland, M. Holland, D. A. J. Moran, C. R. Stanley, and I. G. Thayne, "50-nm T-gate metamorphic GaAs HEMTs with fT of 440 GHz and noise figure of 0.7 dB at 26 GHz," IEEE Electron Device Lett. vol. 26, no. 11, pp. 784-786, Nov. 2005.
    • (2005) IEEE Electron Device Lett , vol.26 , Issue.11 , pp. 784-786
    • Elgaid, K.1    McLelland, H.2    Holland, M.3    Moran, D.A.J.4    Stanley, C.R.5    Thayne, I.G.6
  • 4
    • 17044389834 scopus 로고    scopus 로고
    • Nano-gate transistor - World's fastest InP-HEMT
    • K. Shinohara and T. Matsui, "Nano-gate transistor - World's fastest InP-HEMT -," J. Nat. Inst. Inf. Commun. Technol., vol. 51, no. 1/2, pp. 95-102, 2004.
    • (2004) J. Nat. Inst. Inf. Commun. Technol , vol.51 , Issue.1-2 , pp. 95-102
    • Shinohara, K.1    Matsui, T.2
  • 6
    • 4944232749 scopus 로고    scopus 로고
    • 50 nm InGaAs/InAlAs/GaAs metamorphic high electron mobility transistors using double exposure at 50 kV electron-beam lithography without dielectric support
    • S. C. Kim, O. K. Lim, H. S. Lee, T. J. Baek, D.-H. Shin, and J. K. Rhee, "50 nm InGaAs/InAlAs/GaAs metamorphic high electron mobility transistors using double exposure at 50 kV electron-beam lithography without dielectric support," J. Vac. Sci. Technol. B, Microelectron. Process. Phenom., vol. 22, no. 4, pp. 1807-1810, 2004.
    • (2004) J. Vac. Sci. Technol. B, Microelectron. Process. Phenom , vol.22 , Issue.4 , pp. 1807-1810
    • Kim, S.C.1    Lim, O.K.2    Lee, H.S.3    Baek, T.J.4    Shin, D.-H.5    Rhee, J.K.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.