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Volumn , Issue , 2006, Pages 19-27

3D system integration technologies

(1)  Beyne, Eric a  

a IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POWER SYSTEM INTERCONNECTION; ELECTRONICS PACKAGING; MULTILAYERS; PASSIVATION; SILICON WAFERS;

EID: 34249801921     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/VTSA.2006.251113     Document Type: Conference Paper
Times cited : (103)

References (16)
  • 1
    • 34250350680 scopus 로고    scopus 로고
    • nd conf. on 3D Architectures for Semiconductor Integration and packaging, RTI international, Burlingame, California, April 13-15, 2004 and Tempe, Arizona, June 13-15, 2005
    • nd conf. on "3D Architectures for Semiconductor Integration and packaging", RTI international, Burlingame, California, April 13-15, 2004 and Tempe, Arizona, June 13-15, 2005
  • 2
    • 2442691737 scopus 로고    scopus 로고
    • 3D Interconnection and packaging: Impending reality or still a dream?
    • 15-19 February, San Francisco, CA, USA, IEEE
    • E.Beyne, "3D Interconnection and packaging: impending reality or still a dream?" proceedings of the IEEE International Solid-State Circuits Conference, ISSCC2004, 15-19 February 2004; San Francisco, CA, USA, IEEE, 2004, pp.138-145.
    • (2004) proceedings of the IEEE International Solid-State Circuits Conference, ISSCC2004 , pp. 138-145
    • Beyne, E.1
  • 3
    • 34250334525 scopus 로고    scopus 로고
    • Phil Garrou, 3D Integration: A status report, proceecings 3D Architectures for Semiconductor Integration and packaging, RTI international, Burlingame, Tempe, Arizona, June 13-15, 2005.
    • Phil Garrou, "3D Integration: A status report", proceecings "3D Architectures for Semiconductor Integration and packaging", RTI international, Burlingame, Tempe, Arizona, June 13-15, 2005.
  • 8
    • 24644478692 scopus 로고    scopus 로고
    • High aspect ratio through-wafer interconnect for three dimensional integrated circuits
    • Orlando, Florida, May 31-June 3
    • th ECTC, Orlando, Florida, May 31-June 3, 2005, pp.343-348
    • (2005) th ECTC , pp. 343-348
    • Ranganathan, N.1
  • 11
    • 34250362563 scopus 로고    scopus 로고
    • Multilayer thin film technology as an enabling technology for System in Package (SiP) and "above-IC" Processing
    • idem [7] pp
    • E.Beyne, "Multilayer thin film technology as an enabling technology for System in Package (SiP) and "above-IC" Processing", idem [7] pp.91-99.
    • Beyne, E.1
  • 12
    • 34250369458 scopus 로고    scopus 로고
    • 3D LSI Technology and Wafer-level Stack
    • idem [7, pp
    • Misma Koyanagi, "3D LSI Technology and Wafer-level Stack", idem [7], pp.101-108.
    • Koyanagi, M.1
  • 13
    • 0035714371 scopus 로고    scopus 로고
    • Technologies for very high bandwidth electrical interconnects between next generation VLSI circuits
    • Technical Digest, December 2-5, Washington, D.C
    • E.Beyne, "Technologies for very high bandwidth electrical interconnects between next generation VLSI circuits", IEEE-IEDM 2001 Technical Digest, December 2-5, Washington, D.C., S23-p3, 2001.
    • (2001) IEEE-IEDM
    • Beyne, E.1
  • 14
    • 34250316833 scopus 로고    scopus 로고
    • Wafer bonding of damascene-patterenced metal/adhesive redistribution layers for via-first 3D Interconnect
    • Orlando, Florida, May 31-June 3
    • th ECTC, Orlando, Florida, May 31-June 3, 2005, pp. 332-336.
    • (2005) th ECTC , pp. 332-336
    • McMahon, J.H.1
  • 15
    • 34250347952 scopus 로고    scopus 로고
    • patent US 10817763
    • patent US 10817763
  • 16
    • 34250360117 scopus 로고    scopus 로고
    • patent EP 0100014, US 6,506,664
    • patent EP 0100014, US 6,506,664


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.