Fabrication of a close-packed hemispherical submicron lens array and its application in photolithography

Optics Express

Volumn 15, Issue 11, 2007, Pages 6774-6783

  Chang, Wei Lun ^a   Wei, Pei Kuen ^a,b  

^a RESEARCH CENTER FOR APPLIED SCIENCES   (Taiwan)

^b NATIONAL TAIWAN OCEAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

BOROSILICATE GLASS; DRY ETCHING; ELECTROMAGNETIC WAVE DIFFRACTION; FINITE DIFFERENCE METHOD; PHOTOLITHOGRAPHY; TIME DOMAIN ANALYSIS;

MULTILAYER HEXAGONAL STRUCTURES; OPTICAL SPOT ARRAY; SUBMICRON NICKEL RODS;

LENSES;

EID: 34249663873     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.15.006774     Document Type: Article

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