Magnetoresistance characterization of NiFe films with a planar point contact

IEEE Transactions on Magnetics

Volumn 43, Issue 6, 2007, Pages 3007-3009

  Ohsawa, Yuichi ^a,b  

^a TOSHIBA CORPORATION   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

Magnetic confinement; Magnetic domains; Magnetoresistance; Permalloy films

Indexed keywords

ANISOTROPY; DOMAIN WALLS; MAGNETIC DOMAINS; MAGNETORESISTANCE; POINT CONTACTS;

FITTING APPROXIMATION; MAGNETIC CONFINEMENT; PERMALLOY FILMS;

METALLIC FILMS;

EID: 34249033788     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMAG.2007.892179     Document Type: Article

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