In situ magnetoresistance measurements of a nanoconstricted nickel-iron film with in-plane configuration

IEEE Transactions on Magnetics

Volumn 41, Issue 10, 2005, Pages 2577-2579

  Ohsawa, Yuichi ^a,b  

^a TOSHIBA CORPORATION   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

Magnetic domains; Magnetoresistance; Nanotechnology; Nickel alloys

Indexed keywords

ANISOTROPY; ETCHING; FERROMAGNETISM; ION BEAMS; MAGNETIC DOMAINS; MAGNETIC FIELD EFFECTS; MAGNETORESISTANCE; NANOTECHNOLOGY; NICKEL ALLOYS; POINT CONTACTS;

ETCHING PROCESS; MAGNETIC GEOMETRY; MAGNETORESISTANCE MEASUREMENTS; TEST ELEMENT (TE);

THIN FILMS;

EID: 27744482580     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMAG.2005.854665     Document Type: Article

References (6)

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