Fabrication and in situ magnetoresistance measurement of a Ni point-contact in planar configuration

Journal of Magnetism and Magnetic Materials

Volumn 287, Issue SPEC. ISS., 2005, Pages 491-495

  Ohsawa, Yuichi ^a,b  

^a TOSHIBA CORPORATION   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

Ballistic; Magnetoresistance; Nano contact; Point contact

Indexed keywords

ELECTRODEPOSITION; ELECTRON TRANSITIONS; ETCHING; FABRICATION; ION BEAMS; MAGNETIC DEVICES; MILLING (MACHINING); POINT CONTACTS; TRANSMISSION ELECTRON MICROSCOPY;

BALLISTIC; NANO-CONTACT; SPIN-POLARIZED ELECTRON TRANSPORT;

MAGNETORESISTANCE;

EID: 12344323494     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmmm.2004.10.081     Document Type: Conference Paper

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