Utilisation of scattered light for excimer laser beam monitoring

Laser Physics Letters

Volumn 2, Issue 9, 2005, Pages 459-464

  Hermann, A ^a   Kaemling, A ^a   Ach, F ^a   Fischer, C ^b   Viol W ^a  

^a University of Applied Sciences and Arts   (Germany)

^b Metrolux Messtechnik GmbH   (Germany)

Author keywords

ArF laser; Dielectric mirror; F 2 laser; KrF laser; Laser beam monitoring; Light scattering; Material processing; UV laser

Indexed keywords

EID: 34248666999     PISSN: 16122011     EISSN: None     Source Type: Journal    
DOI: 10.1002/lapl.200510021     Document Type: Article

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