Hydrogen desorption and diffusion in PECVD silicon nitride. Application to passivation of CMOS active pixel sensors

Microelectronic Engineering

Volumn 84, Issue 9-10, 2007, Pages 2169-2172

  Benoit, D ^a   Regolini, J ^a   Morin, P ^a  

^a STMICROELECTRONICS   (France)

Author keywords

Hydrogen desorption; Hydrogen diffusion; Passivation; Silicon nitride

Indexed keywords

CMOS INTEGRATED CIRCUITS; DESORPTION; ELECTRIC CURRENT MEASUREMENT; MICROELECTRONICS; PASSIVATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

CMOS ACTIVE PIXEL SENSORS; HYDROGEN DESORPTION; HYDROGEN DIFFUSION; PASSIVATION STACK;

SILICON NITRIDE;

EID: 34248641417     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.04.071     Document Type: Article

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