Characterization of structure and morphology of an advanced p-channel field effect transistor under uniaxial stress by synchrotron x-ray diffraction

Applied Physics Letters

Volumn 90, Issue 17, 2007, Pages

  Parikh, A ^a   Yarbrough, W ^a   Mason, M ^a   Sridhar, S ^a   Chidambaram, P R ^a   Cai, Z ^b  

^a TEXAS INSTRUMENTS   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EMBEDDED SYSTEMS; INTERFACES (MATERIALS); STRAIN CONTROL; SYNCHROTRON RADIATION; X RAY DIFFRACTION ANALYSIS;

DIFFRACTION SPACE MAPS; NONPARALLEL REFLECTING PLANES; UNIAXIAL STRESSES;

FIELD EFFECT TRANSISTORS;

EID: 34248577669     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2734480     Document Type: Article

References (6)

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