Sputtering yield measurements at glancing incidence using a quartz crystal microbalance

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 25, Issue 2, 2007, Pages 236-245

  Kolasinski, Robert D ^a,c   Polk, James E ^b   Goebel, Dan ^b   Johnson, Lee K ^b  

^a California Institute of Technology   (United States)

^b CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^c SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

QUARTZ CRYSTAL MICROBALANCE (QCM); RESONANCE FREQUENCY SHIFT; SPUTTERING YIELD MEASUREMENTS;

MEASUREMENT THEORY; QUARTZ; RESONANCE; SENSITIVITY ANALYSIS; SPUTTER DEPOSITION; X RAY DIFFRACTION ANALYSIS;

CRYSTALLINE MATERIALS;

EID: 34248549326     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2435375     Document Type: Article

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