Application of secondary neutral mass spectrometry in low-energy sputtering yield measurements

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 129, Issue 1, 1997, Pages 123-129

  Bhattacharjee, S ^a   Zhang, J ^a   Shutthanandan, V ^a   Ray, P K ^a   Shivaparan, N R ^b   Smith, R J ^b  

^a TUSKEGEE UNIVERSITY   (United States)

^b MONTANA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; CURRENT DENSITY; ION BEAMS; ION SOURCES; MATHEMATICAL MODELS; MOLYBDENUM; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTERING; SURFACES; XENON;

LOW ENERGY SPUTTERING YIELD MEASUREMENT; SECONDARY NEUTRAL MASS SPECTROMETRY;

MASS SPECTROMETRY;

EID: 0031168116     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(97)00145-6     Document Type: Article

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