Synthesis and electrochemical characteristics of Ta-N thin films fabricated by cathodic arc deposition

Applied Surface Science

Volumn 253, Issue 16, 2007, Pages 6811-6816

  Li, Li ^a,b   Niu, Erwu ^a   Lv, Guohua ^a   Zhang, Xianhui ^c   Chen, Huan ^a   Fan, Songhua ^a   Liu, Chizi ^a   Yang, Si Ze ^a  

^a INSTITUTE OF PHYSICS   (China)

^b CIVIL AVIATION UNIVERSITY OF CHINA   (China)

^c CHANGCHUN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Cathodic arc deposition; Corrosion; Microstructure; Tantalum nitride

Indexed keywords

CRYSTAL ORIENTATION; DEPOSITION; ION BOMBARDMENT; MICROSTRUCTURE; STAINLESS STEEL; STOICHIOMETRY; SYNTHESIS (CHEMICAL); TANTALUM COMPOUNDS;

CATHODIC ARC DEPOSITION; CORROSION BEHAVIOR; GROWTH DEFECTS; TANTALUM NITRIDE;

THIN FILMS;

EID: 34248359553     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.01.128     Document Type: Article

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