Composition of tantalum nitride thin films grown by low-energy nitrogen implantation: A factor analysis study of the Ta 4∈f XPS core level

Applied Physics A: Materials Science and Processing

Volumn 81, Issue 7, 2005, Pages 1405-1410

  Arranz, A ^a   Palacio, C ^a  

^a UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ATTENUATION; DIFFUSION; ION BEAMS; ION IMPLANTATION; REACTION KINETICS; SATURATION (MATERIALS COMPOSITION); SPUTTERING; TANTALUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

FACTOR ANALYSIS (FA); TAN PHASES; TANTALUM NITRIDATION; TANTALUM NITRIDE;

THIN FILMS;

EID: 24944562402     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-004-3182-0     Document Type: Article

References (31)

1. K. Baba, R. Hatada: Surf. Coat. Technol. 84, 429 (1996)
2. W. Ensinger, M. Kiuchi, M. Satou: J. Appl. Phys. 77, 6630 (1995)
3. Q.Y. Zhang, X.X. Mei, D.Z. Yang, F.X. Chen, T.C. Ma, Y.M. Wang, F.N. Teng: Nucl. Instrum. Methods Phys. Res. B 127-128, 664 (1997)
4. K. Volz, M. Kiuchi, W. Ensinger: Surf. Coat. Technol. 128-129, 298 (2000)
5. G.S. Chen, S.T. Chen: J. Appl. Phys. 87, 8473 (2000)
6. J. Chuang, M. Chen: Thin Solid Films 322, 213 (1998)
7. M. Stavrev, D. Fischer, C. Wenzel, K. Drescher, N. Mattern: Thin Solid Films 307, 79 (1997)
8. C. Chang, J.S. Jeng, J.S. Chen: Thin Solid Films 413, 46 (2002)
9. M.H. Tsai, S.C. Sun, C.P. Lee, H.T. Chiu, C.E. Tsai, S.H. Chuang, S.C. Wu: Thin Solid Films 270, 531 (1995)
10. G. Jun, S. Cho, K. Kim, H. Shin, D. Kim: Jpn. J. Appl. Phys. 37, 30 (1998)
11. H. Park, K. Byun, W. Lee: Jpn. J. Appl. Phys. 41, 6153 (2002)
12. X. Zhou, H.K. Dong, H.D. Li, B.X. Liu: Vacuum 39, 307 (1989)
13. P.M. Raole, A.M. Narsale, D.C. Kothari, P.S. Pawar, S.V. Gogawale, L. Guzman, M. Dapor: Mater. Sci. Eng. A 115, 73 (1989)
14. A. Arranz, C. Palacio: Surf. Interface Anal. 29, 653 (2000)
15. N. Terao: Jpn. J. Appl. Phys. 10, 248 (1971)
16. S. Badrinarayanan, S. Sinha: J. Appl. Phys. 69, 1141 (1991)
17. I. Takano, S. Isobe, T.A. Sasaki, Y. Baba: Appl. Surf. Sci. 37, 25 (1989)
18. T.B. Massalski: in Binary Alloy Phase Diagrams, Vol. 3 (Materials Information Society, Materials Park, OH 1990) p. 2703
19. A. Arranz: Surf. Sci. 563, 1 (2004)
20. A. Proctor, M.P.A. Sherwood: Anal. Chem. 54, 13 (1982)
21. E.R. Malinowski, D.C. Howery: Factor Analysis in Chemistry (Krieger, Malabar, FL 1989)
22. C. Palacio, H.J. Mathieu: Surf. Interface Anal. 16, 178 (1990)
23. J.N. Fiedor, A. Proctor, M. Houalla, D.M. Hercules: Surf. Interface Anal. 20, 1 (1993)
24. A. Arranz, C. Palacio: Surf. Interface Anal. 22, 93 (1994)
25. C.M. Penchina: Phys. Rev. B 14, 4407 (1976)
26. P. Prieto, L. Galán, J.M. Sanz: Appl. Surf. Sci. 70-71, 186 (1993)
27. NIST X-ray Photoelectron Spectroscopy Database, ver. 3.3 [http://srdata.nist.gov/xps/]
28. Y. Baba, T.A. Sasaki, I. Takano: J. Vac. Sci. Technol. A 6, 2945 (1988)
29. W Möller, W. Eckstein: Nucl. Instrum. Methods Phys. Res. B 2, 814 (1984)
30. W. Möller, W. Eckstein, J.P. Biersack: Comput. Phys. Commun. 51, 355 (1988)
31. M.P. Seah, W.A. Dench: Surf. Interface Anal. 1, 2 (1979)