Small area right angle bends fabricated with hybrid conventional and interference lithography

Microwave and Optical Technology Letters

Volumn 49, Issue 6, 2007, Pages 1300-1303

  Zhou, Yaling ^a   Tan, Hua ^a   Klotzkin, David J ^a  

^a University of Cincinnati   (United States)

Author keywords

Interference lithography; Planar lightwave circuits; Waveguides

Indexed keywords

INTERFERENCE LITHOGRAPHY; PLANAR LIGHTWAVE CIRCUITS; WAVEGUIDE STRUCTURES;

BRAGG REFLECTORS; CAVITY RESONATORS; ELECTRON BEAM LITHOGRAPHY; PHOTONIC CRYSTALS; PLANAR WAVEGUIDES;

PHOTONIC DEVICES;

LITHOGRAPHY; OPTICS;

EID: 34248154323     PISSN: 08952477     EISSN: None     Source Type: Journal    
DOI: 10.1002/mop.22408     Document Type: Article

References (17)

1. C. Manolatou, S.G. Johnson, S. Fan, P.R. Villeeuve, H.A. Haus, and J.D. Joannopoulus, High-density integrated optics, IEEE J Lightwave Technol 17 (1999), 1682-1692.
2. A. Chincholi, Parallel fabrication of photonic crystals using interference lithography, Masters thesis, University of Cincinnati, 2005.
3. N.D. Lai, W.P. Liang, J.H. Lin, and C.C. Hsu, Rapid fabrication of large-area periodic structures containing well-defined detects by combining holography and mask techniques, Opt Express 13 (2005), 5331-5337.
4. R.L. Espinola, R.U. Ahmad, F. Pizzuto, M.J. Steel, and R.M. Osgood, Jr. A study of high-index-contrast 90° waveguide bend structures, Opt Express 8 (2001), 517-528.
5. Y.Z. Tang, W.H. Wang, T. Li, and Y.L. Wang, Integrated waveguide turning mirror in silicon on insulator, IEEE Photonics Technol Lett 14 (2002), 68-70.
6. R.U. Ahmad, F. Pizzuto, G.S. Camarda, R.L. Espinola, H. Rao, and R.M. Osgood, Ultracompact corner-mirrors and T-branches in silicon-on-insulator, IEEE Photonics Technol Lett 14 (2002), 65-67.
7. G.P. Nordin, S. Kim, J. Cai, and J. Jiang, Hybrid integration of conventional waveguide and photonic crystal structures, Opt Express 10(2002), 1334-1341.
8. S. Kim, G.P. Nordin, J. Jiang, and J. Cai, High efficiency 90° silica waveguide bend using an air hole photonic crystal region, IEEE Photonics Technol Lett 16, (2004), 1846-1848.
9. Y.P. Li and C.H. Henry, Silica-based optical integrated circuits. Proc Inst Elect Eng Optoelectron 143 (1996), 263-280.
10. A.Kaneko, T. Goh, H. Yamada, T. Tannaka, and I. Ogawa, Design and applications of silica-based planar lightwave circuits, IEEE J Sel Topic Quantum Electron 5 (1999), 1227-1236.
11. L. Li, G.P. Nordin, J.M. English, and J. Jiang, Small-area bends and beamsplitters for low-index-contrast waveguides, Opt Express 11 (2002), 282-290.
12. A. Taflove, Computational electrodynamics: The finite-difference time-domain method, Artech House, Boston, MA, 1995.
13. J.P. Berenger, A perfectly matched layer for the absorption of electromagnetic waves, J Comput Phys 114 (1994), 185-200.
14. 3 gases, J Vac Sci Technol B15 (1997), 640-645.
15. A. Chincholi, S. Banerjee, J. Huang, S. Hui, H. Tan, Y. Zhou, and D. Klotzkin, Parallel fabrication of photonic crystals (PC) using interference lithography for integrated waveguide-PC devices, Proceedings of AO/COSI/IP/SRS 2005, Charlotte, NC, June 2005.
16. 2 waveguides by roughness reduction, Opt Lett 26 (2001), 888-891.
17. A.M. Agarwal, L. Liao, J.S. Foresi, M.R. Black, X. Duan, and L.C. Kimmerling, Low-loss polycrystalline silicon waveguides for silicon photonics, J Appl Phys 80 (1996), 6120-6127.