A new way of manufacturing high resolution optical encoders by nanoimprint lithography

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 848-852

  Merino, S ^a   Retolaza, A ^a   Juarros, A ^a   Landis, S ^b  

^a IK4 TEKNIKER   (Spain)

^b CEA GRENOBLE   (France)

Author keywords

Dimensional metrology; Nanoimprint lithography; Optical encoders

Indexed keywords

GLASS; NANOIMPRINT LITHOGRAPHY; OPTICAL RESOLVING POWER; SILICON;

DIMENSIONAL METROLOGY; LINEAR ENCODERS; OPTICAL ENCODERS; PATTERN TRANSFER;

OPTICAL DEVICES;

GLASS; LITHOGRAPHY; PRINTING; SILICON;

EID: 34247891641     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.024     Document Type: Article

References (7)

1. Demarest FC. Meas. Sci. Technol. 9 (1998) 1024
2. Bobrof N. Meas. Sci. Technol. 4 (1993) 907
3. Jourlin Y., and Jay Y. O. Perriaux. Prec. Eng. 26 (2002) 1
4. Original title: Digitale Langen -und Winkelmeβtechnik. Dr. Johannes Heidenhain GmbH, Traunreut, third ed., Printing and Binding: Ludwig Auer, Donauworth, 1998.
5. Ferrera J., Schattenburg M.L., and Smith H. J. Vac. Sci. Technol. B. 14 (1996) 4009
6. Heilmann R.K., Chen C.G., Konkola P.T., and Schattenburg M.L. Nanotechnology 15 (2004) S504
7. Merino S., Retolaza A., and Lizuain I. Microelec. Engineering 83 (2006) 897