Fast heating and cooling in nanoimprint using a spring-loaded adapter in a preheated press

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 932-936

  Schift, Helmut ^a   Bellini, Sandro ^a,b   Gobrecht, Jens ^a,b   Reuther, Frank ^c   Kubenz, Mike ^d   Mikkelsen, Morten Bo ^e   Vogelsang, Konrad ^a  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b UNIVERSITY OF APPLIED SCIENCES AND ARTS NORTHWESTERN SWITZERLAND   (Switzerland)

^c JENOPTIK Laser Optik Systeme GmbH   (Germany)

^d MICRO RESIST TECHNOLOGY GMBH   (Germany)

^e TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

Author keywords

Alignment fixture; Isothermal process; Nanoimprint lithography; Thermal imprint; Thermocuring; Thermoplast

Indexed keywords

COOLING; HEATING; PRINTING PRESSES; THERMOPLASTICS;

ALIGNMENT FIXTURE; FAST HEATING; THERMAL IMPRINT; THERMOCURING;

NANOIMPRINT LITHOGRAPHY;

COOLING; HEATING; ISOTHERMAL PROCESS; LITHOGRAPHY; PRINTING; PRINTING MACHINES; THERMOPLASTICS;

EID: 34247853356     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.061     Document Type: Article

References (6)

1. Schift H., and Kristensen A. Nanoimprint lithography. In: Bhushan B. (Ed). Handbook of Nanotechnology. second ed. (2007), Springer Verlag, Berlin, Germany. 978-3-540-29855-7 239 Ch. A/8
2. M. Tormen, Abstract book, NNT conference, October 19-21, Nara, Japan, 2005, p. 130.
3. Pfeiffer K., Fink M., Bleidiessel G., Gruetzner G., Schulz H., Scheer H.-C., Hoffmann T., Sotomayor Torres C.M., Gaboriau F., and Cardinaud Ch. Microelectron. Eng. 53 (2000) 411
4. Pfeiffer K., Reuther F., Fink M., Gruetzner G., Carlberg P., Maximov I., Montelius L., Seekamp J., Zankovych S., Sotomayor-Torres C.M., Schulz H., and Scheer H.-C. Microelectron. Eng. 67-68 (2003) 266
5. Schift H., Heyderman L.J., Auf der Maur M., and Gobrecht J. Nanotechnology 12 (2001) 173
6. Scheer H.-C., Bogdanski N., Wissen M., Konishi T., and Hirai Y. J. Vac. Sci. Technol. 23 (2005) 2963