Study of the effect of process parameters for n-heptylamine plasma polymerization on final layer properties

Thin Solid Films

Volumn 515, Issue 17, 2007, Pages 6844-6852

  Martin, Yves ^a,b   Boutin, David ^a,b   Vermette, Patrick ^a,b  

^a UNIVERSITÉ DE SHERBROOKE   (Canada)

^b UNIVERSITY INSTITUTE OF GERIATRICS OF SHERBROOKE   (Canada)

Author keywords

Atomic force microscopy (AFM); Deposition process; Glow discharge; Plasma polymerization; Quartz crystal microbalance (QCM); Surface characterization; Surface plasmon resonance (SPR); X ray photoelectron spectroscopy (XPS)

Indexed keywords

ATOMIC FORCE MICROSCOPY; FILM THICKNESS; GLOW DISCHARGES; PLASMA POLYMERIZATION; REACTION KINETICS; STATISTICAL METHODS; SURFACE PLASMON RESONANCE; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

FACTORIAL DESIGN; HEPTYLAMINE; PROCESS PARAMETERS; QUARTZ CRYSTAL MICROBALANCE (QCM); RADIO FREQUENCY GLOW DISCHARGES;

AMINES;

EID: 34247847834     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.02.002     Document Type: Article

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