Fabrication of a gas sensor with a piezoelectric PZT film deposited by a novel hydrothermal microwave-assisted annealing

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 1300-1304

  Ko, Fu Hsiang ^a   Hsu, Yi Chieh ^a   Wang, Menq Te ^a   Huang, Gue wha Steven ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

Gas sensor; Microwave assisted annealing; Piezoelectric PZT film; Sol gel

Indexed keywords

CHEMICAL SENSORS; MICROFABRICATION; MICROWAVES; SCANNING ELECTRON MICROSCOPY; SOL-GEL PROCESS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

FURNACE ANNEALING; MICROWAVE ASSISTED ANNEALING; PIEZOELECTRIC PZT FILM;

PIEZOELECTRIC DEVICES;

EID: 34247636193     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.069     Document Type: Article

References (23)

1. Okahata Y., Matsunobu Y., Ijiro K., Mukae M., Murakami A., and Makinolb K. J. Am. Chem. Soc. 114 (1992) 8299
2. Minunni M., Mascini M., Carter R.M., Jacobs M.B., Lubrano G.J., and Guilbault G.G. Anal. Chim. Acta 325 (1996) 169
3. Nagashima K., and Funakubo H. Jpn. J. Appl. Phys. Part 1 39 (2000) 212
4. Alonso R.E., García A.L., Ayala A., and de la Presa P. J. Phys.-Conden. Mater. 10 (1998) 2139
5. Foster C.M., Bai G.R., Csencsits R., Vetrone J., Jammy R., Wills L.A., Carr E., and Amano J. J. Appl. Phys. 81 (1997) 2349
6. Park H.H., Kim W.S., Yang J.K., Park H.H., and Hill R.H. Microelectron. Eng. 71 (2004) 215
7. Kwak B.S., Boyd E.P., and Erbil A. Appl. Phys. Lett. 53 (1988) 1702
8. Kanno I., Fujii S., Kamada T., and Takayama R. Appl. Phys. Lett. 70 (1997) 1378
9. Taguchi I., Pignolet A., Wang L., Proctor M., Lavy F., and Shmid P.E. J. Appl. Phys. 73 (1993) 394
10. Hase T., Sakuma T., Miyasaka Y., Hirata K., and Hosokawa N. Jpn. J. Appl. Phys. Part 1 32 (1993) 4061
11. Krupanidhi S.B., Maffei N., Sayer M., and El-Assal K. J. Appl. Phys. 54 (1983) 6601
12. Sreenivas K., Sayer M., and Grarett P. Thin Solid Films 172 (1989) 251
13. Gupta R., Srivastava M.P., Balakrishnan V.R., Kodama R., and Peterson M.C. J. Phys. D 37 (2004) 1091
14. Zhou Y.C., Yang Z.Y., and Zheng X.J. Surface & Coatings Technol. 162 (2003) 202
15. Zhang S.T., Tan W.S., Yuan G.L., Zhang X.J., Cheng H.W., Chen Y.F., Liu Z.G., and Ming N.B. Microelectron. Eng. 66 (2003) 701
16. Liu J.M., Yu L.C., Yuan G.L., Yang Y., Chan H.L.W., and Liu Z.G. Microelectron. Eng. 66 (2003) 798
17. Yu Y.J., Chan H.L.W., Wang F.P., and Zhao L.C. Microelectron. Eng. 66 (2003) 726
18. Snitka V., Ulcinas A., Nemciauskas K., and Lendraitis V. Microelectron. Eng. 83 (2006) 1456
19. Hwang J.S., Kim W.S., Park H.H., and Kim T.S. Microelectron. Eng. 70 (2003) 73
20. Ko C.-J., Lee C.-Y., Ko F.-H., Chen H.-L., and Chu T.-C. Microelectron. Eng. 73-74 (2004) 570
21. Ko F.-H., Lee C.-Y., Ko C.-J., and Chu T.-C. Carbon 43 (2005) 727
22. Chang Y.-C., Ko F.-H., Ko C.-J., and Chu T.-C. Anal. Chim. Acta 526 (2004) 121
23. Ko F.-H., and Chen H.-L. J. Anal. At. Spectrom. 16 (2001) 1337