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Volumn 84, Issue 5-8, 2007, Pages 1128-1131
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The passivation layer formation in the cryo-etching plasma process
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Author keywords
Cryo etching; Passivation layer; Plasma process
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Indexed keywords
CRYOGENICS;
DEPOSITION;
ELECTRONS;
ELLIPSOMETRY;
PASSIVATION;
PLASMA ETCHING;
SILICON COMPOUNDS;
CRYO-ETCHING;
PASSIVATION LAYERS;
PLASMA PROCESS;
SILICON ETCHING;
SEMICONDUCTOR GROWTH;
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EID: 34247611939
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/j.mee.2007.01.048 Document Type: Article |
Times cited : (28)
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References (7)
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