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Volumn 84, Issue 5-8, 2007, Pages 1054-1057

Leaching mechanisms in immersion lithography with or without top coat

Author keywords

Immersion; Immersion dedicated resists; Leaching; Top coat

Indexed keywords

HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; LENSES; LITHOGRAPHY; MASS SPECTROMETRY; PHOTORESISTS; PROTECTIVE COATINGS;

EID: 34247580844     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.117     Document Type: Article
Times cited : (12)

References (7)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.