|
Volumn 84, Issue 5-8, 2007, Pages 1054-1057
|
Leaching mechanisms in immersion lithography with or without top coat
|
Author keywords
Immersion; Immersion dedicated resists; Leaching; Top coat
|
Indexed keywords
HIGH PERFORMANCE LIQUID CHROMATOGRAPHY;
LENSES;
LITHOGRAPHY;
MASS SPECTROMETRY;
PHOTORESISTS;
PROTECTIVE COATINGS;
IMMERSION DEDICATED RESISTS;
LEACHING MECHANISMS;
SCANNER LENS;
TOP COATS;
LEACHING;
|
EID: 34247580844
PISSN: 01679317
EISSN: None
Source Type: Journal
DOI: 10.1016/j.mee.2007.01.117 Document Type: Article |
Times cited : (12)
|
References (7)
|