The structure, diffusion and phase formation in Mo/Si multilayers with stressed Mo layers

Thin Solid Films

Volumn 515, Issue 17, 2007, Pages 7011-7019

  Zubarev, E N ^a   Zhurba, A V ^a   Kondratenko, V V ^a   Pinegyn, V I ^a   Sevryukova, V A ^a   Yulin, S A ^b   Feigl, T ^b   Kaiser, N ^b  

^a NATIONAL TECHNICAL UNIVERSITY   (Ukraine)

^b FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

Diffusion; Interfaces; Multilayers; Phase transformations; Silicides; Transmission electron microscopy; X ray diffraction

Indexed keywords

ANNEALING; DIFFUSION; INTERFACES (MATERIALS); MOLYBDENUM; MULTILAYERS; PHASE TRANSITIONS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

COMPRESSIVE STRESSES; DIFFUSIVE COMPONENTS; MOLYBDENUM DISILICIDE;

SILICON;

EID: 34247570905     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.01.012     Document Type: Article

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