Depth dependence of residual strains in polycrystalline Mo thin films using high-resolution x-ray diffraction

Journal of Applied Physics

Volumn 79, Issue 9, 1996, Pages 6872-6879

  Malhotra, S G ^a   Rek, Z U ^a,b   Yalisove, S M ^a   Bilello, J C ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

^b SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0008001806     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.361509     Document Type: Article

References (50)

1. J. A. Floro, C. V. Thompson, R. Carel, and P. D. Bristowe, J. Mater. Res. 9, 2411 (1994).
2. H. Windischmann, Crit. Rev. Solid State Mater. Sci. 17, 547 (1992).
3. W. D. Nix, Metall. Trans. A 20, 2217 (1989).
4. D. J. Morrison, J. W. Jones, G. S. Was, A. Mashayekhi, and D. W. Hoffman, in Thin Films: Stresses and Mechanical Properties, edited by John C. Bravman, William D. Nix, David M. Barnett, and David. A. Smith, Mater. Res. Symp. Proc., Vol. 130 (MRS, Pittsburgh, PA, 1989), p. 53.
5. P. A. Flinn, Mater. Res. Symp. Proc. 130, 41 (1989).
6. M. Renninger, Phys. Lett. 1, 104 (1962).
7. M. Renninger, Z. Phys. 19, 20 (1965).
8. M. Renninger, Z. Naturforsch. 160, 1110 (1961).
9. C. L. Kuo, P. E. Vanier, and J. C. Bilello, J. Appl. Phys. 55, 375 (1984).
10. J. Tao, L. H. Lee, and J. C. Bilello, J. Electron. Mater. 20, 819 (1991).
11. G. G. Stoney, Proc. R. Soc. London Ser. A 82, 172 (1909).
12. D. W. Hoffman, Phys. Thin Films 3, 211 (1965).
13. C. S. Barrett and T. B. Massalski, Structure of Metals, 3rd ed. (McGraw-Hill, New York, 1966), pp. 466-485.
14. H. P. Klug and L. E. Alexander, X-Ray Diffraction Procedures (Wiley, New York, 1974), pp. 755-790.
15. L. H. Schwartz and J. B. Cohen, Diffraction from Materials, 2nd ed. (Springer, New York, 1987), pp. 372-381.
16. M. R. James and J. B. Cohen, Treatise on Materials Science and Technology, edited by Herbert Herman (Academic, New York, 1980), Vol. 19A, pp. 2-62.
17. I. C. Noyan and J. B. Cohen, in Residual Stress and Stress Relaxation, edited by Eric Kula and Volker Weiss, Sagamore Army Materials Research Conference Proceedings (Plenum, New York, 1982), pp. 1-17.
18. H. Dölle and V. Hauk, Z. Metal. 68, 728 (1977).
19. I. C. Noyan and J. B. Cohen, Residual Stress Measurement by Diffraction and Interpretation (Springer, New York, 1987), pp. 117-163.
20. W. C. Marra, P. Eisenberger, and A. Y. Cho, J. Appl. Phys. 50, 6927 (1979).
21. P. Eisenberger and W. C. Marra, Phys. Rev. Lett. 46, 1081 (1981).
22. P. H. Fouss and S. Brennan, Ann. Rev. Mater. Sci. 20, 365 (1990).
23. L. J. Martinez-Miranda, J. J. Santiago-Aviles, W. R. Graham, P. A. Heiney, and M. P. Siegal, J. Mater. Res. 9, 1434 (1994).
24. R. Venkatraman, P. R. Besser, J. C. Bravman, and S. Brennan, J. Mater. Res. 9, 328 (1994).
25. P. R. Besser, S. Brennan, and J. C. Bravman, J. Mater. Res. 9, 13 (1994).
26. C. J. Shute and J. B. Cohen, J. Appl. Phys. 70, 2104 (1991).
27. T. Imura, S. Weissmann, and J. J. Slade, Jr., Acta. Crystallogr. 15, 786 (1962).
28. J. A. Bain, L. J. Chyung, S. Brennan, and B. M. Clemens, Phys. Rev. B 44, 1184 (1991).
29. Ph. Goudeau, K. F. Badawi, A. Naudon, and G. Gladyszewski, Appl. Phys. Lett. 62, 246 (1993).
30. L. Maniguet, M. Ignat, M. Dupeux, P. A. Flinn, Ph. Normandon, P. Gergaud, and J. J. Bacmann, Advanced Metallization for ULSI Applications, edited by T. S. Cale and F. S. Pintchovski, Mater. Res. Soc. Symp. Proc., Vol. VIII (MRS, Pittsburgh, PA, 1992), p. 67.
31. M. Vill, D. P. Adams, S. M. Yalisove, and J. C. Bilello, Acta. Metall. mater. 43, 427 (1995).
32. C. Montcalm, B. T. Sullivan, H. Pepin, J. A. Dobrowolski, and M. Sutton, Appl. Opt. 33, 2057 (1994).
33. L. J. Parfitt (private communication).
34. H. Dosch, Phys. Rev. B 35, 2137 (1987).
35. J. F. Nye, Physical Properties of Crystals (Oxford University Press, Oxford, 1985), pp. 41-43.
36. G. E. Deiter, Mechanical Metallurgy (McGraw-Hill, New York, 1961), p. 39.
37. O. P. Karpenko, J. C. Bilello, and S. M. Yalisove, J. Appl. Phys. 76, 4610 (1994).
38. D. P. Adams, L. J. Parfitt, J. C. Bilello, S. M. Yalisove, and Z. U. Rek, Thin Solid Films (to be published).
39. H. Dölle, J. Appl. Crystallogr. 12, 489 (1979).
40. I. C. Noyan, Metall. Trans. A 14, 249 (1983).
41. M. F. Doerner and S. Brennan, J. Appl. Phys. 63, 126 (1988).
42. R. M. Fisher, J. Z. Duan, and A. G. Fox, in Thin Films: Stresses and Mechanical Properties, edited by John C. Bravman, William D. Nix, David M. Barnett, and David A. Smith, Mater. Res. Soc. Symp. Proc., Vol. 130 (MRS, Pittsburgh, PA, 1989), p. 249.
43. R. W. Hoffman, Surf. Interface Anal. 3, 62 (1981).
44. T. J. Vink, M. A. J. Somers, J. L. C. Daams, and A. G. Dirks, J. Appl. Phys. 70, 4301 (1991).
45. R. A. Winholtz and J. B. Cohen, Aust. J. Phys. 41, 189 (1988).
46. M. R. James and J. B. Cohen, Advances in X-Ray Analysis (Plenum, New York, 1776), Vol. 20, pp. 291-305.
47. C. J. Kelly and M. A. Short, Advances in X-Ray Analysis (Plenum, New York, 1970), Vol. 14, pp. 377-388.
48. C. F. Jatczak and H. F. Boehm, Advances in X-Ray Analysis (Plenum, New York, 1973), Vol. 17, pp. 354-370.
49. H. Zantopulos and C. F. Jatczak, Advances in X-Ray Analysis (Plenum, New York, 1970), Vol. 14, pp. 360-376.
50. D. A. Witte, R. A. Winholtz, and S. P. Neal, Advances in X-Ray Analysis (Plenum, New York, 1994), Vol. 37, pp. 265-277.