Morphological and electrical study of FIB deposited amorphous W nanowires

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 837-840

  Horvath E ^a,b   Neumann, P L ^b   Toth A L ^a   Horvath Z E ^a   Biro L P ^a  

^a RESEARCH INSTITUTE FOR TECHNICAL PHYSICS AND MATERIALS SCIENCE   (Hungary)

^b BUDAPEST UNIVERSITY OF TECHNOLOGY AND ECONOMICS   (Hungary)

Author keywords

Resistance measurement; Temperature dependence; W deposition

Indexed keywords

ELECTRIC RESISTANCE MEASUREMENT; FOCUSED ION BEAMS; NITROGEN; OHMIC CONTACTS; TEMPERATURE MEASUREMENT; TUNGSTEN ALLOYS;

MICROPELLISTOR DEVICE; OHMIC BEHAVIOUR; TEMPERATURE DEPENDENCE;

NANOWIRES;

EID: 34247569475     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.076     Document Type: Article

References (7)

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