Rapid thermal two-stage metal-organic chemical vapor deposition growth of epitaxial BaTiO3 thin films

Thin Solid Films

Volumn 515, Issue 16 SPEC. ISS., 2007, Pages 6442-6446

  Kreinin, O ^a   Kuzmina, N P ^b   Zolotoyabko, E ^a   Kaul, A R ^b  

^a TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

^b MOSCOW STATE UNIVERSITY   (Russian Federation)

Author keywords

BaTiO3; Metal organic precursors; MOCVD; Thin films

Indexed keywords

BARIUM COMPOUNDS; ENERGY DISPERSIVE SPECTROSCOPY; EPITAXIAL GROWTH; EPITAXIAL LAYERS; MELTING POINT; RAPID THERMAL ANNEALING; SURFACE MORPHOLOGY; SYNTHESIS (CHEMICAL);

BATIO3; METAL-ORGANIC PRECURSORS; MIXED LIGAND COMPLEXES; STRUCTURAL QUALITY;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 34247558635     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.11.051     Document Type: Article

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