Single-shot method for bias-free LER/LWR evaluation with little damage

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 1779-1782

  Yamaguchi, Atsuko ^a   Steffen, Robert ^b   Yamamoto, Jiro ^a   Kawada, Hiroki ^b   Iizumi, Takashi ^b  

^a HITACHI LTD   (Japan)

^b HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

Author keywords

Bias; CD SEM; Line edge roughness; Linewidth roughness; Noise

Indexed keywords

LITHOGRAPHY; NOISE ABATEMENT; PARAMETER ESTIMATION; SIGNAL ANALYSIS; SPURIOUS SIGNAL NOISE;

LINE EDGE ROUGHNESS; LINEWIDTH ROUGHNESS; LINEWIDTH ROUGHNESS (LWR); RANDOM NOISE;

LINEWIDTH;

EID: 34247557535     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.271     Document Type: Article

References (4)

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2. Villarrubia J.S., and Bunday B.D. Proc. SPIE 5752 (2005) 480
3. Yamaguchi A., Ichinose K., Shimamoto S., Fukuda H., Tsuchiya R., Ohnishi K., Kawada H., and Iizumi T. Proc. SPIE 5375 (2004) 468
4. Yamaguchi A., Steffen R., Kawada H., and Iizumi T. Proc. SPIE 6152 (2006) 615240