Investigation of ZnO films on Si<111> substrate grown by low energy O+ assisted pulse laser deposited technology

Materials Letters

Volumn 61, Issue 14-15, 2007, Pages 2961-2964

  Chen, ChangChun ^a   Yu, BenHai ^b   Liu, JiangFeng ^b   Dai, QiRun ^b   Zhu, YunFeng ^a  

^a NANJING TECH UNIVERSITY   (China)

^b XINYANG NORMAL UNIVERSITY   (China)

Author keywords

Pulsed laser deposition; Thin film; ZnO

Indexed keywords

ATOMIC FORCE MICROSCOPY; FULL WIDTH AT HALF MAXIMUM; MICROCRYSTALLINE SILICON; PULSED LASER DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THIN FILMS; X RAY DIFFRACTION;

ION CHANNELING; POLYCRYSTALLINE STRUCTURE;

ZINC OXIDE;

EID: 34247542227     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2006.10.047     Document Type: Article

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