Control of crystal orientation of Ti thin films by sputtering

Electrochimica Acta

Volumn 44, Issue 21, 1999, Pages 3945-3952

  Hoshi, Y ^a   Suzuki, E ^a   Shimizu, H ^b  

^a TOKYO POLYTECHNIC UNIVERSITY   (Japan)

^b NIIGATA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; ELECTRON ENERGY LEVELS; KINETIC ENERGY; MAGNETRON SPUTTERING; METALLIC FILMS; SPUTTER DEPOSITION; SURFACE ROUGHNESS; TEXTURES; THIN FILMS;

CONTROL OF FILM TEXTURE; SPUTTER BEAM DEPOSITION; SURFACE SMOOTHNESS;

TITANIUM;

EID: 0032691472     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0013-4686(99)00103-6     Document Type: Article

References (9)

1. Kitakami O., Ojima K., Ogawa Y., Maro T., Fugiwara H. IEEE Trans. Magn. MAG-23:1989;2797.
2. Allen J.C., Fisher R.D. IEEE Trans. Magn. MAG-23:1987;122.
3. Dew S.K., Liu D., Brett M.J., Smy T. J. Vac. Sci. Technol. B11:(4):1993;1281.
4. Dew S.K. J. Appl. Phys. 76:1994;4857.
5. Hoshi Y., Suzuki E., Osaka T. J. Mag. Mag. Mat. 176:1997;51.
6. Turner G.M., Falconer I.S., James B.W., McKenzie D.R. J. Appl. Phys. 65:(9):1989;3671.
7. Hoshi Y., Suzuki E. J. Mag. Soc. Jpn. 18 S1:1994;323.
8. Thompson M.W. Philos. Mag. 18:1968;377.
9. Dixit K.R. Philos. Mag. J. of Sci. 16:(109):1933;1049.