Conduction studies on ZnTe thin films

Journal of New Materials for Electrochemical Systems

Volumn 10, Issue 1, 2007, Pages 27-31

  Amutha, R ^a   Subbarayan, A ^a   Sathyamoorthy, R ^a   Natarajan, K ^a   Velumani, S ^b  

^a KONGUNADU ARTS AND SCIENCE COLLEGE   (India)

^b SCHOOL OF ENGINEERING AND SCIENCES   (Mexico)

Author keywords

Dielectric; Optoelectronic devices; Semiconductors; X Ray diffraction; ZnTe thin films

Indexed keywords

ALUMINUM; DIELECTRIC DEVICES; ELECTRODES; ENERGY GAP; OPTOELECTRONIC DEVICES; SEMICONDUCTOR MATERIALS; SOLAR CELLS; X RAY DIFFRACTION; ZINC COMPOUNDS;

HOPPING CONDUCTION MECHANISM; TEMPERATURE COEFFICIENT OF CAPACITANCE (TCC); TEMPERATURE COEFFICIENT OF PERMITIVITY (TCP); ZNTE THIN FILMS;

THIN FILMS;

EID: 34247223741     PISSN: 14802422     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (37)

1. J. D. Merchant and M. Cocievera, J. Electrochem. Soc., 143, 4054 (1996)
2. T. Ota and K. Takahashi, Solid-State Electron. 16, 1089 (1973)
3. Manish Jain, Vitaliy V. Godlevsky, Jeffrey J. Derby and James R. Chelikowsky, Phys. Review B, 65, 35212 (2001)
4. Ziari M, Steiner W, Ranon P, Klein M and Trivedi S, Appl. Phys. Lett. 601, 1052 (1992)
5. D. Rioux, D.W. Niles, H. Hochst, J.Appl.Phys. 73, 8381 (1993)
6. th NREL Photovoltaic Program Review, 1993, p.345
7. T. A. Gessert, A. R. Mason, R. C. Reedy, R. Maston, T. J. Cutts, P. Sheldon, J. Electron. Mater., 24, 1443 (1995)
8. J. Tang, D. Mao, L. Feng, W. Song, J. U. Trefny, in: Proceedings of the 25 th PVSC, 13-17 May 1996 Washington, DC, p.952
9. L. Feng, D. Mao, J. Tang, R.T. Culins, J.U. Trenfny, J. Electron.Mater. 25, 1442 (1996)
10. U. Pal, S. Saha, B.K, Samantaray, H.D. Banerjee and A.K. Chaudhuri, phys.stat.sol.(a) 111, 515 (1989)
11. U. Pal, S. Saha, A. K. Chaudhuri, V. V. Rao and H. D. Banerjee, J.Phys.D: Appl.Phys. 22, 965 (1989)
12. B. Maiti, P. Gupta, S. Chaudhuri and A. K. Pal, Thin Solid Films, 239, 104 (1994)
13. T. A. Gessert, X. Li, T. J. Coutts, A. R. Mason and R. J. Matson, J.Vac.Sci.Technol.A 12(4), 1501 (1994)
14. Michael Neumann-Spallart and Christian Konigstein, Thin Solid Films, 265, 3 (1995)
15. Jing-quan Zhang, Liang-huan Feng, Wei Cai, Jia-gui Zheng, Ya-ping Cai, Bing Li, Li-li Wu and Ye Shao, Thin Solid Films, 414, 113 (2002)
16. T. Mahalingam, V.S. John, G. Ravi and P.J. Sebastian, Cryst.Res.Technol. 37(4), 329 (2002)
17. T. Mahalingam, V.S. John, S. Rajendran and P.J. Sebastian, Semicond.Sci.Technol. 17, 465 (2002)
18. R. D. Gould and C. J. Bowler, Thin Solid Films 164, 281 (1988)
19. B.B. Ismail and R.D. Gould, phys.stat.sol.(a) 115, 237 (1989)
20. S. Gogoi and K. Bagua, Thin Solid Films 92, 227 (1982)
21. R. Sathyamoorthy, Sa. K. Narayandass, C. Balasubramanian and D. Mangalaraj, Proc. Solid State Phys. Symp., 33C, 409 (1991)
22. Taro Hino and Ken Yamashita, Japan. J. Appl. Phys, 13(6), 1015 (1974)
23. N. C. Parakh and J. C. Garg, Ind. J. Pure and Appl. Phys., 25, 110 (1987)
24. Marc Burgelman, Thin Solid Films, 70, 1 (1980)
25. S. Tolansky, Multiple beam interferometry of surfaces and films (Oxford University Press, New Jercy) 1948
26. B.D. Cullity, in "Elements of X-Ray diffraction", (Addison-Wesley Publishing Company, Inc., London, 1978)
27. P.W. Zukowski, S.B. Kantorow, D. Maczka and V.F. Stelakh, phys.stat.sol.(a) 112, 695 (1989)
28. A. Vasudevan, S. Carin, M. R. Melloch and E. S. Harmon, Appl. Phys. Lett. 73, 671 (1998)
29. H. M. Lin, Y. F. Chen, J. L. Shen and C. W. Chou, Appl. Phys. Lett. 78(13), 1909 (2001)
30. M. D. Kannan, Sa. K. Narayandass, C. Balasubramanian and D. Mangalaraj, phys.stat.sol.(a) 121, 515 (1990)
31. H. Birey, J. Appl. Phys. 49, 2898 (1978)
32. W. S. Chan and A. K. Jonscher, phys.stat.sol. 32, 749 (1969)
33. F. Argall and A. K. Jonscher, Thin Solid Films 2, 185 (1968)
34. B. G. Sealy, A. J. Crocker, M. J. Lee and R. F. Egerton, Thin Solid Films 11, 365 (1972)
35. A. K. Jonscher, J. Non-Crystall.Solids, 8, 293 (1972)
36. N. Croitora and N. Marinescu, Phys.Rev. 9, 202 (1964)
37. P. A. Walley, Thin Solid Films 2, 327 (1968)