Fabrication of micro-thin film thermocouples

International Conference on Thermoelectrics, ICT, Proceedings

Volumn 2003-January, Issue , 2003, Pages 673-676

  Miyazaki, K ^a   Takamiya, T ^a   Tsukamoto, H ^a  

^a KYUSHU INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Fabrication; Insulation; Ion beams; Nickel; Semiconductor films; Silicon compounds; Temperature distribution; Temperature measurement; Transistors; Tungsten

Indexed keywords

FABRICATION; HEAT FLUX; HEATING EQUIPMENT; INSULATION; ION BEAMS; NICKEL; SEMICONDUCTING SILICON; SEMICONDUCTOR JUNCTIONS; SILICON COMPOUNDS; TEMPERATURE DISTRIBUTION; TEMPERATURE MEASUREMENT; THERMOCOUPLES; TRANSISTORS; TUNGSTEN; TUNGSTEN COMPOUNDS;

ELECTRIC POWER; IR MICROSCOPE; MICRO-HEATERS; SEMICONDUCTOR FILMS; SPATIAL RESOLUTION; THERMOCOUPLE JUNCTIONS; THIN FILM THERMOCOUPLE; TUNGSTEN FILMS;

THIN FILMS;

EID: 34247160194     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICT.2003.1287602     Document Type: Conference Paper

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