Roughness-induced variation of magnetic anisotropy in ultrathin epitaxial films: The undulating limit

Physical Review B - Condensed Matter and Materials Physics

Volumn 75, Issue 13, 2007, Pages

  Vaz, C A F ^a,b   Steinmuller, S J ^a   Bland, J A C ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b Yale University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 34247149789     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.75.132402     Document Type: Article

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