Influence of plasma treatments on the properties of SnOx thin films

High Temperature Material Processes

Volumn 10, Issue 4, 2006, Pages 603-616

  Mukhamedshina, D M ^a   Beisenkhanov, N B ^a   Mit, K A ^a   Botvin, V A ^a   Valitova, I V ^a   Dmitrieva, E A ^a  

^a INSTITUTE OF PHYSICS AND TECHNOLOGY   (Kazakhstan)

Author keywords

Magnetron sputtering; Oxygen hydrogen plasma treatments; Subnanometer cluster structure; Tin dioxide

Indexed keywords

GLOW DISCHARGES; HYDROGEN; MAGNETRON SPUTTERING; OXYGEN; PLASMA APPLICATIONS; TIN DIOXIDE;

ARGON OXYGEN ATMOSPHERE; GLASS SUBSTRATES; OXYGEN HYDROGEN PLASMA TREATMENTS; SUBNANOMETER CLUSTER STRUCTURE;

THIN FILMS;

EID: 34147214560     PISSN: 10933611     EISSN: None     Source Type: Journal    
DOI: 10.1615/HighTempMatProc.v10.i4.110     Document Type: Article

References (8)

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