Determination of electrical and solar cell parameters of FTO/CuPc/Al Schottky devices

Journal of Physics and Chemistry of Solids

Volumn 68, Issue 4, 2007, Pages 556-560

  Rajesh, K R ^a   Varghese, Shaji ^b,c   Menon, C S ^c  

^a INDIAN INSTITUTE OF TECHNOLOGY BOMBAY   (India)

^b ST THOMAS COLLEGE   (India)

^c MAHATMA GANDHI UNIVERSITY   (India)

Author keywords

A. Semiconductors; A. Thin films; B. Vapor deposition; D. Electrical properties; D. Transport properties

Indexed keywords

CURRENT DENSITY; ENERGY GAP; PERMITTIVITY; SEMICONDUCTOR MATERIALS; SOLAR CELLS; THIN FILMS; TRANSPORT PROPERTIES; ULTRAVIOLET SPECTROSCOPY; VAPOR DEPOSITION;

ABSORPTION SPECTRUM; FLUORINATED TIN OXIDE (FTO); IDEALITY FACTOR; SCHOTTKY EMISSION;

SCHOTTKY BARRIER DIODES;

EID: 34147207499     PISSN: 00223697     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jpcs.2007.01.023     Document Type: Article

References (34)

1. Yu G., Gao J., Hummelen J.C., Wudl F., and Heeger A.J. Science 270 (1995) 1789
2. Granström M., Petritsch K., Arias A.C., Lux A., Andersson M.R., and Friend R.H. Nature 395 (1998) 257
3. Leznoff C.C., Lever A.B.P., and Phthalocyanines. Properties and Applications (1996), VCH Publishers Inc., New York p. 219
4. Zhou X., Pfeiffer M., Blochwitz J., Werner A., Nollau A., Fritz T., and Leo K. Appl. Phys. Lett. 78 (2001) 410
5. Newton M.I., Starke T.K.H., Willis M.R., and McHale G. Sensors Actuators B 67 (2000) 307
6. Joseph C.M., and Menon C.S. Mater. Lett. 51 (2001) 200
7. Loutfy R.O., Sharp J.H., Hsiao C.K., and Ho R. J. Appl. Phys. 52 8 (1981) 5218
8. Rudiono, Okazaki S., and Takeuchi M. Thin Solid Films 334 (1998) 187
9. Tang C.W. Appl. Phys. Lett. 48 (1986) 183-185
10. Takeuchi R., and Takeuchi M. Jpn. J. Appl. Phys. 36 (1997) L127
11. Dodelet J.P., Pommier H.P., and Ringuet M. J. Appl. Phys. 53 (1982) 4270
12. Pfeiffer M., Beyer A., Plönnigs B., Nollau A., Fritz T., Leo K., Schlettwein D., Hiller S., and Wöhrle D. Sol. Energy Mater. Sol. Cells 63 (2000) 83
13. Kwong C.Y., Djurisic A.B., Chui P.C., Lam L.S.M., and Chan W.K. Appl. Phys. A Mater. Sci. Process. 77 (2003) 555
14. Hu W., and Matsumura M. J. Phys. D: Appl. Phys. 37 (2004) 1434
15. Riad A.S., Khalil S.M., and Darwish S. Thin Solid Films 249 (1994) 219
16. Sharma G.D., Raj Kumar, and Roy M.S. Sol. Energy Mater. Sol. Cells 90 (2006) 32
17. Singh V.P., Parsarathy B., Singh R.S., Aguilera A., Anthony J., and Payne M. Sol. Energy Mater. Sol. Cells. 90 (2006) 798
18. Rajesh K.R., and Menon C.S. Semicond. Sci. Technol. 20 (2005) 464
19. Breeze A.J., Schlesinger Z., Carter S.A., and Brock P.J. Phys. Rev. B 64 (2001) 125205
20. Qiao Q., and McLeskey J.T. Appl. Phys. Lett. 86 (2005) 153501
21. Kawashima T., Matsui H., and Tanabe N. Thin Solid Films 445 (2003) 241
22. Maissel L.I., and Glang R. Handbook of Thin Film Technology (1983), McGraw-Hill, New York
23. Martin M., André J.J., and Simon J. J. Appl. Phys. 54 (1983) 2792
24. Ritz A., and Lüth H. Appl. Phys. A 1 (1983) 75
25. Abass A.K., Krier A., and Collins R.A. Phys. Stat. Sol. (a) 142 (1994) 435
26. El-Nahass M.M., Bahabri F.S., AL Ghamdi A.A., and Al-Harbi S.R. Egypt. J. Sol. 25 2 (2002) 307
27. Chamberlain G.A., and Cooney P.J. Chem. Phys. Lett. 66 1 (1979) 88
28. Sze S.M. Physics of Semiconductor Devices (1981), Eastern Wiley, New Delhi
29. Ahamed A., and Collins R.A. Phys. Stat. Sol. (a) 123 (1991) 201
30. Gould R.D. Thin Solid Films 125 (1985) 63
31. Gould R.D. J. Phys. D: Appl. Phys. 19 (1986) 1785
32. Wilson W., and Collins R.A. Sensors Actuators 12 (1978) 389
33. Sharma G.D. Synth. Metals 74 (1995) 227
34. Mahapatro A.K., and Ghosh S. Appl. Phys. Lett. 80 25 (2002) 4840