Investigation of electrical properties of organic Schottky diodes using MgPc - The effect of oxygen absorption and post deposition annealing

Semiconductor Science and Technology

Volumn 20, Issue 5, 2005, Pages 464-468

  Rajesh, K R ^a   Menon, C S ^a  

^a MAHATMA GANDHI UNIVERSITY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

DYES; ELECTRIC CONDUCTIVITY; EVAPORATION; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DOPING; THERMAL EFFECTS; THIN FILMS;

MAGNESIUM PHTHALOCYANINE (MGPC); RECTIFICATION PROPERTIES; SPACE CHARGE DENSITY; SPACE CHARGE LIMITED CONDUCTIVITY (SCLC);

SCHOTTKY BARRIER DIODES;

EID: 24144444068     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/20/5/024     Document Type: Article

References (21)

1. Gould R D 1996 Coord. Chem. Rev. 156 237
2. Collins R A and Mohammed K A 1998 J. Phys. D: Appl. Phys. 21 154
3. Abdel-Malik T G 1991 Thin Solid Films 205 241
4. Abdel-Malik T G, Ahmed A A and Riad A S 1990 Phys. Status Solidi a 121 507
5. Gravano S, Hassan A K and Gould R D 1991 Int. J. Electron. 70 477
6. Martin M, André J J and Simon J 1981 Nouv. J. Chim. S 485
7. Maissel L I and Glang R 1983 Hand Book of Thin Film Technology (New York: McGraw-Hill)
8. Martin M, André J J and Simon J 1983 J. Appl. Phys. 54 2792
9. Ahamed A and Collins R A 1991 Phys. Staus Solidi a 123 201
10. Gould R D 1985 Thin Solid Films 125 63
11. Gould R D 1986 J. Phys. D: Appl. Phys. 9 1785
12. Twarowski A J 1982 J. Chem. Phys. 77 5840
13. Sadaoka Y, Jones T A and Göpel W 1989 J. Mater. Sci. Lett. 8 1095
14. Hassan A K and Gould R D 1993 Int. J. Electron. 74 59
15. Rhoderick E H and Williams R H 1988 Metal-Semiconductor Contacts 2nd edn (Oxford: Clarendon)
16. Ghosh A K and Feng T 1973 J. Appl. Phys. 44 2781
17. Riad A S, Khalil S M and Darwish S 1994 Thin Solid Films 249 219
18. Wilson W and Collins R A 1978 Sensors Actuators 12 389
19. Sharma G D 1995 Synth. Met. 74 227
20. Simmons J G 1971 J. Phys. D: Appl. Phys. 38 2378
21. Fan F R and Faulkner L R 1978 J. Chem. Phys. 69 3334