The crystallization temperature of silicon nanoparticles

Nanotechnology

Volumn 18, Issue 17, 2007, Pages

  Roura, P ^a   Farjas, J ^a   Pinyol, A ^b   Bertran, E ^c  

^a UNIVERSITY OF GIRONA   (Spain)

^b R and D Materials   (Belgium)

^c UNIVERSITY OF BARCELONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CRYSTALLIZATION KINETICS; DIFFERENTIAL SCANNING CALORIMETRY; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

NUCLEATION RATE;

NANOPARTICLES;

NANOPARTICLE; SILICON;

ARTICLE; CALORIMETRY; CHEMICAL ANALYSIS; CRYSTALLIZATION; ENERGY; KINETICS; OXYGEN CONCENTRATION; PARTICLE SIZE; PREDICTION; PRIORITY JOURNAL; TEMPERATURE; TRANSMISSION ELECTRON MICROSCOPY; VAPOR;

EID: 34047245283     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/18/17/175705     Document Type: Article

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