Self-organization of gold nanoclusters on hexagonal SiC and SiO2 surfaces

Journal of Applied Physics

Volumn 101, Issue 6, 2007, Pages

  Ruffino, F ^b   Canino, A ^b   Grimaldi, M G ^b   Giannazzo, F ^a   Bongiorno, C ^a   Roccaforte, F ^a   Raineri, V ^a  

^a CNR   (Italy)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICA; SILICON CARBIDE; SUBSTRATES;

GOLD NANOCLUSTERS; SELF-ORGANIZATION; SURFACE DIFFUSION COEFFICIENT;

GOLD COMPOUNDS;

EID: 34047164463     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2711151     Document Type: Article

References (32)

1. D. Goldhaber-Gordon, M. S. Montemerlo, J. C. Love, G. J. Opiteck, and J. C. Ellenbogen, Proc. IEEE 85, 521 (1997).
2. P. Moriarty, Rep. Prog. Phys. 64, 297 (2001).
3. D. K. Ferry and S. M. Goodnick, Transport in Nanostructures (Cambridge University Press, Cambridge, 1997).
4. Nanoparticles, edited by G. Schmid (Wiley-VCH, Weinheim, 2004).
5. F. Ruffino, F. Giannazzo, F. Roccaforte, V. Raineri, and M. G. Grimaldi, Appl. Phys. Lett. 89, 243113 (2006).
6. F. Ruffino, F. Giannazzo, F. Roccaforte, V. Raineri, and M. G. Grimaldi, Appl. Phys. Lett. 89, 263108 (2006).
7. J. Chen, T. Lee, J. Su, W. Wang, and M. A. Reed, in Encyclopedia of Nanoscience and Nanotechnology, edited by H. S. Nalwa (American Scientific Publishers, Stevenson Ranch, CA, 2004), Vol. X, pp. 1-30.
8. S. R. Wang and Z. L. Liu, Curr. Appl. Phys. 2, 393 (2002).
9. T. P. Chow, Microelectron. Eng. 83, 112 (2006).
10. A. Cabrita, L. Pereira, D. Brida, A. Lopes, A. Marques, I. Ferreira, E. Fortunato, and R. Martins, Appl. Surf. Sci. 184, 437 (2001).
11. L. A. Kosyachenko, V. M. Sklyarchuk, and Y. F. Sklyarchuk, Solid-State Electron. 42, 145 (1998).
12. L. M. Porter and R. F. Davis, Mater. Sci. Eng., B 34, 83 (1995).
13. H. Matsunami, Microelectron. Eng. 83, 2 (2006).
14. R. R. Siergiej, et al., Mater. Sci. Eng., B 61-62, 9 (1999).
15. Z. Wang and P. Wynblatt, Surf. Sci. 398, 259 (1998).
16. D. Barreca, A. Gasparotto, E. Tondello, G. Bruno, and M. Losurdo, J. Appl. Phys. 96, 1655 (2004).
17. I. Beszeda, E. G. Gontier-Moya, and Á. W. Imre, Appl. Phys. A: Mater. Sci. Process. 81, 673 (2005).
18. A. Baldan, J. Mater. Sci. 37, 2171 (2002).
19. W. Ostwald, Z. Elektrochem. Angew. Phys. Chem. 37, 385 (1901).
20. I. M. Lifshitz and V. V. Slyozov, J. Phys. Chem. Solids 19, 35 (1961).
21. C. Wagner, Z. Elektrochem. 65, 581 (1961).
22. B. K. Chakraverty, J. Phys. Chem. Solids 28, 2401 (1967).
23. A. J. Ardell, Acta Metall. 20, 61 (1972).
24. A. D. Brailsford and P. Wynblatt, Acta Metall. 27, 489 (1979).
25. K. Tsumaraya and Y. Miyata, Acta Metall. 31, 437 (1983).
26. J. A. Marqusee and J. Rose, J. Chem. Phys. 80, 536 (1984).
27. P. W. Voorhees, Annu. Rev. Mater. Sci. 22, 197 (1992).
28. M. Zinke-Allmang, L. C. Feldman, and M. H. Grabov, Surf. Sci. Rep. 16, 377 (1992).
29. K. Shorlin, S. Krylov, and M. Zinke-Allmang, Physica A 261, 248 (1998).
30. P. Buffat and J. P. Borel, Phys. Rev. A 13, 2287 (1976).
31. Á. W. Imre, E. G. Gontier-Moya, D. L. Beke, I. A. Szabo, and G. Erdélyi, Surf. Sci. 441, 133 (1999).
32. K. N. Tu, J. W. Mayer, and L. C. Feldman, Electronic Thin Film Science (Macmillan, New York, 1992).