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Volumn 25, Issue 1, 2007, Pages 86-90

Interface chemical characterization of novel W/HfO2/GeON/Ge stacks

Author keywords

[No Author keywords available]

Indexed keywords

GERMANIUM COMPOUNDS; HAFNIUM COMPOUNDS; INTERFACES (MATERIALS); LEAKAGE CURRENTS; PASSIVATION; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 34047154071     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2409960     Document Type: Article
Times cited : (7)

References (15)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.