Free volume effects in chemically amplified DUV positive resists

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 271-274

  Pain, L ^c   Le Cornec, C ^a   Rosilio, C ^b   Paniez, P J ^c  

^a CEA LETI   (France)

^b DIF   (France)

^c ORANGE LABS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; DIFFUSION; DISSOLUTION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAFT COPOLYMERS; LITHOGRAPHY; PHYSICAL PROPERTIES; REFRACTIVE INDEX; THICKNESS MEASUREMENT;

CHEMICALLY AMPLIFIED SYSTEMS; DISSOLUTION MEASUREMENT; FREE VOLUME EFFECTS; PERKIN-ELMER DEVELOPMENT RATE MONITOR;

PHOTORESISTS;

EID: 0029752160     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00243-X     Document Type: Article

References (7)

1. W. H. Hinsberg, S. A. Mac Donald, N. J. Clecak, Chem. Mater., 6, (1994), 481-488.
2. P. J. Paniez, C. Rosilio, B. Mouanda, F. Vinet, Proc. SPIE, Vol. 2195, (1994), 14-27.
3. F. Houlihan, F. Bouchard, J. M. J. Fréchet, C. G. Wilson, Can. J. Chem., 63, (1985), 153-162.
4. P. J. Paniez, G. Festes, J. P. Chollet, Proc. SPIE, Vol. 1672, (1992), 623-637.
5. M. Zuniga, E. Tomacruz, A.R. Neureuther, Proc. SPIE, Vol. 2195, (1994), 320-328.
6. P. J. Paniez, L. Pain, J. Photopolymer Sci. Techn., Vol. 8, no4, (1995), 643-652.
7. J. S. Papanu, J. Manjkow, D. W. Hess, D. S. Soong, A. T. Bell, Proc. SPIE, Vol. 771, (1987) 93-101.