Mechanical properties of carbon-modified silicon oxide barrier films deposited by plasma enhanced chemical vapor deposition on polymer substrates

Thin Solid Films

Volumn 515, Issue 13, 2007, Pages 5430-5438

  Bieder, A ^a   Gondoin, V ^a   Leterrier, Y ^b   Tornare, G ^b   von Rohr, Ph Rudolf ^a   Månson, J A E ^b  

^a ETH ZURICH   (Switzerland)

^b LABORATOIRE DE TECHNOLOGIE DES COMPOSITES ET POLYMÈRES LTC   (Switzerland)

Author keywords

Adhesion; Crack onset strain; Fragmentation test; Internal stresses; Plasma enhanced chemical vapor deposition; Silicon oxide

Indexed keywords

ADHESION; CARBON; MECHANICAL PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA SOURCES; RESIDUAL STRESSES; SILICA;

CRACK ONSET STRAIN; FRAGMENTATION TESTS; POLYETHYLENE TEREPHTALATE FILMS; SILICON OXIDE BARRIER COATINGS;

THIN FILMS;

EID: 33947722133     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.12.176     Document Type: Article

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