Ultrathin Bi films on Si(100)

Nanotechnology

Volumn 18, Issue 5, 2007, Pages

  Bobisch, C ^a   Bannani, A ^a   Matena, M ^a,b   Moller R ^a  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

^b UNIVERSITY OF BASEL   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BISMUTH; FILM GROWTH; GRAIN SIZE AND SHAPE; LOW ENERGY ELECTRON DIFFRACTION; NANOCRYSTALLINE SILICON; SCANNING TUNNELING MICROSCOPY; SURFACE ROUGHNESS;

BISMUTH FILMS; FILM FLATNESS; GROWTH CONDITIONS;

ULTRATHIN FILMS;

BISMUTH; SILICATE;

ARTICLE; ELECTRON DIFFRACTION; ENVIRONMENTAL TEMPERATURE; FILM; FILM COATING; LOW TEMPERATURE; PRIORITY JOURNAL; SCANNING TUNNELING MICROSCOPY; SURFACE PROPERTY;

EID: 33947523150     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/18/5/055606     Document Type: Article

References (10)

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