Nanofilm allotrope and phase transformation of ultrathin Bi film on Si(111)-7×7

Physical Review Letters

Volumn 93, Issue 10, 2004, Pages

  Nagao, T ^a,b   Sadowski, J T ^a   Saito, M ^c   Yaginuma, S ^a   Fujikawa, Y ^a   Kogure, T ^d   Ohno, T ^c   Hasegawa, Y ^d   Hasegawa, S ^d   Sakurai, T ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^d UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; BISMUTH; CHEMICAL BONDS; IMAGE PROCESSING; LOW ENERGY ELECTRON DIFFRACTION; METALLIC FILMS; MORPHOLOGY; PHASE TRANSITIONS; PHOSPHORUS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING TUNNELING MICROSCOPY; SILICON; SINGLE CRYSTALS; ULTRAHIGH VACUUM;

ADSORPTION ENERGY; ALLOTROPIC TRANSFORMATIONS; NANOFILMS; ROOM TEMPERATURE (RT);

ULTRATHIN FILMS;

EID: 20844443645     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevLett.93.105501     Document Type: Article

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