Feasibility study of material surface treatment using an atmospheric large-area glow plasma

Thin Solid Films

Volumn 506-507, Issue , 2006, Pages 355-359

  Moon, Se Youn ^a   Han, Je Woo ^a   Choe, Wonho ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Ashing; Atmospheric plasma; Glow discharge; Surface treatment

Indexed keywords

ARGON; CONTACT ANGLE; GLASS; GLOW DISCHARGES; HYDROPHILICITY; MEASUREMENTS; MODIFICATION; OPTICS; OXYGEN; PAPER; PLASMAS; SILICON; TEMPERATURE; THERMAL EFFECTS;

ASHING RATE; ATMOSPHERIC LARGE-AREA PLASMA; FEASIBILITY STUDY; HYDROPHOBIC; LOW GAS TEMPERATURE,; LOW-PRESSURE PLASMAS; PLASMA EXPOSURE TIME;

SURFACE TREATMENT;

EID: 33645220085     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.081     Document Type: Conference Paper

References (10)

1. D.B. Graves IEEE Trans. Plasma Sci. 22 1994 31
2. D.W. Hess J. Vac. Sci. Technol., A, Vac. Surf. Films 8 1990 1677
3. A. Grill Cold Plasma in Material Fabrication 1994 IEEE Press New York
4. F. Massines, G. Gouda, N. Gherardi, M. Duran, and E. Croquesel Plasmas Polym. 6 2001 35
5. J. Park, I. Henins, H.W. Hermann, and G.S. Selwyn J. Appl. Phys. 89 2001 15
6. J.R. Roth Industrial Plasma Engineering vol. 2: Applications to Nonthermal Plasma Processing 2001 IOP Publishing Bristol
7. S.Y. Moon, B.K. Kang, and W. Choe Appl. Phys. Lett. 84 2004 188
8. K. Inomata, H. Koinuma, Y. Oikawa, and T. Shiraishi Appl. Phys. Lett. 66 1995 2188
9. H. Conrads, and M. Schmidt Plasma Sources Sci. Technol. 9 2000 441
10. S.Y. Moon, and W. Choe Spectrochim. Acta, Part B: Atom. Spectrosc. 58 2003 249